Course Title : Charged Particle Beam Apparatus

Code 10C801
Course Year Master Course
Term 2nd term
Class day & Period Wed 4th
Location A1-001
Credits 2
Restriction No Restriction
Lecture Form(s) Lecture
Language Japanese
Instructor Yasuhito Gotoh

Course Description

Fundamental technologies of an ion beam system, such as ion sources, formation and evaluation of ion beams, transport of ion beams, and ion-solid interaction will be presented. Taking ion implantation as one of the example of the ion beam application, the relationship between the incident ion energy and implantation depth will be presented. Each element of a typical ion beam system is explained in detail.

Grading

Evaluation will be made with the results of final examination. Achievements of exercises in the class are also taken into consideration.

Course Goals

To understand the details of an ion beam apparatus: generation, transport and evaluation of an ion beam. Understanding of the entire ion beam apparatus as a system is also purpose of the class.

Course Topics

Theme Class number of times Description
Ion beam systems and their applications 1 Outline of the class is presented. Physical properties of ions in vacuum are given, and ion beam apparatuses and their application will be introduced with some typical examples.
Ion-solid interaction 3 Interaction between high energy ion and solid atoms are given. Major topics are: how the ions transfer their energy to the target atoms, i.e., how the ions are decelerated in the solid, and relationship between incident ion energy and implantation depth is given. Concept of sputtering phenomenon is also presented.
Nature of ion beam 2 Concept of the acceleration voltage is introduced to explain the principle of the ion beam systems. Nature of an ion beam is also presented.
Generation and transport of ion beam 3 Methods of ion generation for various elements are explained. Important equations of beam extraction and beam transport are given. Starting with the paraxial ray equation, concept of transfer matrix is given. Finally, some important physical parameters of ion beams are given.
Mass separators and energy analyzers 3 Details of magnetic sector as mass separator are given. Transfer matrix of the mass separator are presented and focusing effect is described. An important parameter of mass resolution is given. Some different kinds of energy analyzers are also introduced. Deflection and detection systems are also introduced.
Fundamentals of vacuum engineering 2 Fundamentals of vacuum engineering is given. Several pumps used for ion beam systems are also introduced.
Design of ion beam systems 1 Design of an ion beam system under a given condition will be presented. In the last class, achievment test will be performed.

Textbook

Yasuhito Gotoh, Charged Particle Beam Appratus, 2018 version (to be sold at CO-OP shop in Katsura Campus)

Textbook(supplemental)

Junzo Ishikawa, Charged Particle Engineering (Corona).

Prerequisite(s)

Vacuum Electronic Engineering (undergraduate course)

Independent Study Outside of Class

Web Sites

Additional Information

We will have brief practice in each class. Bring your calculator and A4-size writing papers.