Course Title : Micro Process and Material Engineering

Code 10G203
Course Year Master Course
Term 1st term
Class day & Period Mon 4th
Location C3-Lecture Room 2
Credits 2
Restriction No Restriction
Lecture Form(s) Lecture
Language Japanese
Instructor O. Tabata, K. Eriguchi, R. Yokokawa, T. Tsuchiya

Course Description

Micro/nano fabrication processes and materials used to realize micro/nano systems are described. Topics will be photolithography, dry-etching, thin-film deposition, which includes bulk micro machining, surface micro machining and further advanced polymer processing.


Evaluated by homework. All report must be submitted to obtain credits.

Course Goals

To obtain fundamental knowledge about design and fabrication of micro/nano systems and to be familiar with recent fabrication technologies and micro/nano systems.

Course Topics

Theme Class number of times Description
Semiconductor microfabrication 3 Describe about the semiconductor microfabrication techniques.
Thin-film process and evaluation 3 Describe about the thin-film process and evaluation techniques.
Silicon micromachining 3 Describe about the silicon micromachining techniques.
3D lithography 3 Describe about the 3D lithography techniques.
Soft-micromachining 2 Describe about the soft-micromachining techniques.
Feedback 1




Independent Study Outside of Class

Web Sites

Additional Information

Students unfamiliar with Japanese may enroll in this course. Their lessons will be supplemented with presentation slides, homework, and other additional course materials in English.